儀器資訊丨208HR高真空離子濺射儀 208HR High Resolution Sputter Coater
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208HR High Resolution Sputter Coater
The 208HR High Resolution Sputter Coaters from Cressington offer real solutions to the problems encountered when coating difficult samples for FESEM imaging. FESEM applications need extremely thin, fine-grained, uniform coatings to eliminate charging and to improve contrast on low density materials. In order to minimize the effects of grain size the 208HR offers a full range of coating materials and gives unprecedented control over thickness and deposition conditions. The 208HR Turbo Pumped High Vacuum System offers a wide range of operating pressures allowing precise control of both uniformity and conformity of the coating, minimizing charging effects. The HIGH / LOW chamber configuration allows easy adjustment of the distance from target to sample. The MTM-20 High Resolution Thickness Controller has a resolution of better than 0.1nm. This enables precise and reproducible thin coatings, especially in the range of 0.5 - 3nm, a thickness desirable for FESEM applications.
Preferred Coating Materials for FESEM Applications
Pt/Pd: General-purpose high resolution coating material for non-conducting specimens
Cr: Excellent for semi-conductor materials and high resolution back scattered electron imaging
Ir: Excellent, virtually grain-free coating material
The 208HR system is available in a number of configurations to enable to deliver the best high resolution coatings for your applications. The208HR can be supplied with a standard rotary backing pump or a dry scroll pump for clean room applications. The standard 208HR includes both Chromium and Platinum/Palladium as target materials. There is also a 208HR Iridium including an Iridium target providing excellent fine-grained coating for high resolution FE-SEM imaging on a wide variety of samples.
Main Features
1.Wide choice of Coating Materials. Magnetron head design and effective gas handling allow a wide choice of target materials.2.Precision Thickness Control. Thickness optimized for FESEM operating voltage using the MTM-20 High Resolution Thickness Controller.3.Multi-angle Stage Movements. Separate rotary, planetary and tilting stage movements ensure uniform coating with excellent conformity, even on highly topographic samples.4.Multiple Sample Holders. Four sample holders are provided with options to accommodate sample sizes as large as 32mm diameter.5.Variable Chamber Geometry. Chamber geometry is used to adjust deposition rate to optimize structure.6.Wide Range of Operating Pressures. Independent power and pressure adjustment allows operation at argon gas pressure range of 0.2 - 0.005 mbar.7.Compact, Modern, Benchtop Design. Space and energy saving design eliminates need for floor space, water or specialized electrical connections.8.Ease of Operation. System operation and setup is very similar to standard sputter coating and does not require additional cleaning compared to ion beam coaters.
Specifications for the 208HR High Resolution Sputter Coater
Specifications
Sputter head
Low voltage planar magnetron
Quick target change
Wrap-around dark-space shield
Shutter for target conditioning
Targets
Cr, Pt/Pd (standard) or IR (Iridium coater)
optional: Au, Au/Pd, Cu, Ni, Pd, Pt, Ta, Ti and W
Sputter supply
Microprocessor based
Safety interlock
Constant current control independent of vacuum
Digitally selectable current (20, 40, 60 or 80mA)
Chamber size
150mm OD (6")
Variable height, 165 - 250mm (6.5" - 9.8") including glass cylinder (65mm H and 2 metal spacer rings)
Sample stage
Non-repetitive rotary, planetary motion with manual tilt 0-90°
Variable speed rotation
Crystal head
4 sample holders (specify when ordering, see Sample Holders)
Analog metering
Vacuum Atm - .001mb
Current 0-100mA
Control method
Automatic operation of gas purge and leak functions
Automatic process sequencing
Digital timer (0-300 sec) with pause
Automatic venting
Thickness control
MTM-20 controller with terminating facility
Pumping System
Configuration
Turbo drag / rotary pump combination
Optional dry scroll pump instead of rotary pump
Pumping speed
300 l/min at 0.1mb
Pumpdown Time
1 min to 1 x 10-3mb
Ultimate pressure
1 x 10-5mb
Desktop system
Rotary pump is mounted on desktop compatible anti-vibration table
All metal vacuum coupling system
Thickness Controller
MTM-20
Microprocessor based
4 digit display, push button zero
6MHz crystal with lifetime check
5 times/sec update rate ( more information)
Thickness range
0.0 - 999.9nm
Resolution
Better than 0.1nm
Density range
0.50 - 30.00gm/cm3
Tooling factor range
0.25 - 8.00
Termination range
0 - 999.9nm
Services Required
Electrical
100-120 or 200-240VAC, 50/60Hz, (please specify)
Power
550VA max.
Argon gas
Purity, min. 99.995%
Pressure regulated 5 - 6 psi (0.4 bar)
Hose connection, 6.0mm (1/4") ID hose
System Dimensions
Size
Width 600mm (23.6"), Depth 600mm (23.6"), Height 450mm (17.7") (with rotary pump)
Weight
40kg (88.5 lbs) (with rotary pump)
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